| abstract |
The present invention provides a material for forming an underlayer film for lithography, containing at least one of a compound represented by the following formula (1) or a resin containing a structural unit derived from the compound represented by the following formula (1): To do. [Chemical 1] (1) (In Formula (1), R 1 is a 2n-valent group or a single bond having 1 to 60 carbon atoms, and each R 2 is independently a halogen atom, a linear or branched chain having 1 to 10 carbon atoms. Or a cyclic alkyl group, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group, or a hydroxyl group, and the same in the same naphthalene ring or benzene ring N may be an integer of 1 to 4, and when n is an integer of 2 or more, the structural formulas of the structural units in n [] may be the same or different. well, X represents the oxygen atom, a sulfur atom or an uncrosslinked, m2 are each independently integers from 0 to 7, wherein an integer of at least one m 2 is 1 to 7, q 0 or 1 each independently is, however, from the group consisting of R 1 and R 2 At least one member-option is a group containing an iodine atom.) |