http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017033915-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53257 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53214 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 2016-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2017033915-A1 |
| titleOfInvention | Etching solution composition and etching method |
| abstract | The present invention is capable of etching a titanium-based layer and a copper-related layer of a material to be etched having a laminate including a titanium-based layer and a copper-based layer in a lump. It is an object of the present invention to provide an etching solution composition capable of obtaining a fine wire and an etching method including using the etching solution. In order to achieve the above object, the present invention provides (A) 0.1 to 15% by mass of hydrogen peroxide; (B) 0.01 to 1% by mass of a fluoride ion source; (C) the following general formula (I) An organic sulfonic acid compound or a salt thereof represented by the formula: 0.1 to 20% by mass in terms of organic sulfonic acid; (D) a complex 6-membered compound containing at least one azole compound and one nitrogen atom and having three double bonds Provided is an etching solution composition comprising 0.01 to 5% by mass of at least one compound selected from compounds having a ring in the structure and (E) water, and an etching method comprising using the etching solution composition. . [Chemical 3] (In the formula, R represents an alkyl group having 1 to 4 carbon atoms, a hydroxyalkyl group having 1 to 4 carbon atoms, an aryl group having 6 to 10 carbon atoms, or a hydroxyaryl group having 6 to 10 carbon atoms. ) |
| priorityDate | 2015-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 112.