| abstract |
According to the present invention, the actinic ray-sensitive or light-sensitive material contains a compound (A) whose rate of dissolution in an alkaline developer is lowered by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring. A radiation resin composition, a film using the composition, a mask blank, a pattern forming method, and an electronic device manufacturing method are provided. |