http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016175160-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-127 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-17 |
| filingDate | 2016-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2016175160-A1 |
| titleOfInvention | Alkali-soluble resin |
| abstract | The present invention provides an alkali-soluble resin suitably used for obtaining an alkali-soluble radiation-sensitive resin composition having excellent alkali solubility, developer resistance, fine wire adhesion, and pattern straightness, and small film shrinkage. For the purpose. The alkali-soluble resin of the present invention includes (a) a (meth) acrylic acid ester having a cyclic structure and a hydroxyl group, (b) a (meth) acrylic acid ester monomer, and (c) a carboxylic acid or an acid anhydride thereof. It is obtained by reacting. |
| priorityDate | 2015-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 127.