http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016159206-A1

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filingDate 2016-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2018-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2016159206-A1
titleOfInvention Gas barrier film and method for producing the same
abstract The subject of this invention is providing the gas barrier film excellent in gas barrier performance, bending resistance, and adhesiveness, and its manufacturing method. The gas barrier film of the present invention is a gas barrier film having a gas barrier layer on a flexible substrate, and the gas barrier layer satisfies the following requirements (1) and (2). (1) The gas barrier layer contains at least silicon, oxygen, and carbon as constituent elements. (2) A carbon / oxygen distribution curve in which the value of the ratio of the carbon amount to the oxygen amount in the gas barrier layer is plotted in the thickness direction has a maximum value, and the number of the maximum values and the thickness of the gas barrier layer Is a ratio of 0.10 / nm or more.
priorityDate 2015-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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