abstract |
【Task】 A resin composition containing a novel polymer, a pattern forming method using the resin composition, and a method for synthesizing the polymer are provided. [Solution] A resin composition for forming an insulating film, comprising a polymer having a structural unit represented by the following formula (1a) and a structural unit represented by the following formula (1b) and an organic solvent. [Chemical 1] [Wherein T 0 represents a divalent organic group containing at least one arylene group in which at least one hydrogen atom is substituted with an amino group, and T 1 represents at least one arylene group having at least one substituent. The divalent organic group is represented by the following formula (2): [Chemical formula 2] (Wherein Z represents a divalent aliphatic group, aromatic group or alicyclic group which may have a substituent). ] [Selection figure] None |