http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016153052-A1

Outgoing Links

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-84
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-84
filingDate 2016-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2018-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2016153052-A1
titleOfInvention Photomask manufacturing method and inspection apparatus
abstract The method for manufacturing the photomask (10) includes an intermediate inspection step for inspecting the foreign matter on the photomask (18) being manufactured before the final step among the steps for manufacturing the photomask.
priorityDate 2015-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 19.