http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016140166-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 2016-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2016140166-A1 |
| titleOfInvention | Cleaning method, semiconductor device manufacturing method, substrate processing apparatus, and program |
| abstract | The cleaning efficiency in the processing container after the processing for forming the oxygen-containing film is improved. A method of cleaning the inside of a processing container after performing a process for forming an oxygen-containing film on a substrate, comprising: (a) supplying at least hydrogen fluoride gas into the processing container; and (b) inside the processing container In the state where the supply of hydrogen fluoride gas to is stopped, the step of supplying alcohol into the processing container is continuously performed without providing an intermittent period. |
| priorityDate | 2015-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 50.