http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016136481-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F22-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2016-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2016136481-A1 |
| titleOfInvention | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, method for producing electronic device using these, and electronic device |
| abstract | Forming a film using an actinic ray-sensitive or radiation-sensitive resin composition, exposing the film, and developing the exposed film using a developer to form a positive pattern There is provided a pattern forming method including the step of: The actinic ray-sensitive or radiation-sensitive resin composition contains at least a repeating unit (a) represented by the following general formula (1) as a repeating unit having a group that decomposes by the action of an acid to generate a polar group. Resin (P1) is contained. [Chemical 1] |
| priorityDate | 2015-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 358.