Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1016 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-26 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-3246 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G64-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41N1-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-2865 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2017-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-WO2016133072-A1 |
titleOfInvention |
Photosensitive resin composition, lithographic printing plate precursor, lithographic printing plate preparation method, and polymer compound |
abstract |
A photosensitive resin composition excellent in chemical resistance and printing durability of the obtained lithographic printing plate, having good solubility in an aqueous alkali solution in the non-image area of the obtained lithographic printing plate precursor, and the above photosensitive resin It is an object of the present invention to provide a lithographic printing plate precursor using the composition, a method for preparing the lithographic printing plate, and a novel polymer compound. The photosensitive resin composition of the present invention is characterized by containing a polymer compound having a polycyclic structure in the main chain and a sulfonamide group in the main chain, and an infrared absorber. |
priorityDate |
2015-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |