| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-547
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-03682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02363
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-028 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0236 |
| filingDate |
2015-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-WO2016063881-A1 |
| titleOfInvention |
Etching solution for semiconductor substrates |
| abstract |
The present invention relates to an alkaline etching solution for treating the surface of a semiconductor substrate for solar cells, and an etching solution containing at least one hydroxystyrene-based polymer represented by the general formula (1) and an alkaline agent. . ADVANTAGE OF THE INVENTION According to this invention, the effect that the texture formation to the semiconductor substrate for solar cells is possible for a short time by comparatively low temperature side, and it is excellent in productivity is exhibited. |
| priorityDate |
2014-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |