| abstract |
Provided is an imprint mold for step-and-repeat capable of suppressing deformation of an end portion of an uneven pattern formed on a cured resin layer when removing the mold. According to the present invention, between the transparent base material 4, the transparent resin layer 6 having the pattern region 13 formed thereon and the uneven pattern 3 formed thereon, and between the transparent base material and the transparent resin layer, A step-and-repeat imprint mold 2 is provided, which includes a light shielding member 5 provided so as to overlap the pattern region in a part of the pattern region. |