http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015152383-A1

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filingDate 2015-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2015152383-A1
titleOfInvention Polishing composition for hard material
abstract Provided are a polishing composition capable of polishing at a high polishing rate in a use for polishing a polishing object made of a hard material, and a method for producing a hard material using the polishing composition. The polishing composition provided by the present invention is obtained by dispersing abrasive grains made of titanium diboride in a dispersion. Moreover, the manufacturing method of the hard material provided by this invention includes the process of grind | polishing the hard material surface using the said polishing composition.
priorityDate 2014-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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