| abstract |
There is no risk of the substrate surface being scraped or abnormal discharge occurring, an adjustment hole can be provided in the interlayer insulating film, and the position of the film to be formed can be easily corrected according to the position of the lowermost film An active matrix substrate manufacturing method having good overlay accuracy, an active matrix substrate, and a display device including the active matrix substrate are provided. The interlayer insulating film 14 of the active matrix substrate uses an SOG material having photosensitivity, and the gate insulating film 15, the first semiconductor film 16, the second semiconductor film 17, and the source formed on the substrate 10 and the interlayer insulating film 14. It is formed to have an adjustment hole 14b for adjusting the metal pattern. The position of each film is adjusted by visually recognizing the edge of the gate wiring 11 from the adjustment hole 14b. |