http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015060234-A1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3277 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-545 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B37-02 |
filingDate | 2014-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2017-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2015060234-A1 |
titleOfInvention | Film forming method and film forming apparatus |
abstract | The subject of this invention is providing the film-forming method which suppresses generation | occurrence | production of a wrinkle, maintaining the film characteristic of a functional film. The film forming method of the present invention has at least one set of the following steps (1) to (5). Step (1): Step of supplying a film forming gas to the facing space between the resin substrates to be opposed to each other Step (2): Step of forming an endless tunnel-like magnetic field swelled in the facing space Step (3): Opposing Step of generating plasma in space Step (4): A step of disposing a resin substrate oppositely and forming a thin film layer on the resin substrate Step (5): A step of exhausting a film forming gas in the opposite space |
priorityDate | 2013-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 102.