http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015033960-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2014-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2015033960-A1 |
| titleOfInvention | Copolymer for semiconductor lithography, resist composition, and method for producing substrate |
| abstract | A lithographic copolymer having a turbidity Th (80) of 1.0 or more and 4.6 NTU or less, and a turbidity Tm (80) of 1.0 or more and 3.8 NTU or less, The turbidity Th (80) is 10 NTU when n-heptane is added to the PGMEA solution in which the content of the copolymer for lithography is 20 wt% with respect to the total mass of the PGMEA solution. The turbidity Tm is the turbidity of the PGMEA solution when the amount of n-heptane added is (X) h, and 80% of this (X) h n-heptane is added to the PGMEA solution; The amount of methanol added to give a turbidity of 5.0 NTU when methanol is added to a PGMEA solution in which the content of the copolymer for lithography is 20 wt% with respect to the total mass of the PGMEA solution is (X) m. ,this 80% of the amount of methanol X) m, when added to the PGMEA solutions, turbidity of the PGMEA solution. |
| priorityDate | 2013-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 114.