| abstract |
A resist pattern forming method using a resist pattern forming composition comprising at least a polymerizable monomer that is liquid at room temperature, an organic gelling agent, and a photopolymerization initiator, and preparing the resist pattern forming composition A step of applying the prepared resist pattern forming composition on the substrate to form a coating film, a step of gelling the organic gelling agent in the coating film, and a gelling of the organic gelling agent Patterning the coated film. |