http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014178289-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2103-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-68 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6704 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-103 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J31-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-32 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J31-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-32 |
| filingDate | 2014-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2014178289-A1 |
| titleOfInvention | Method and system for cleaning copper exposed substrate |
| abstract | The water outlet of the subsystem provided with the ultraviolet oxidizer and the water inlet of each substrate processing apparatus are connected via a main pipe. A hydrogen peroxide removing device (2) is installed between the UV oxidizer of the subsystem and the non-regenerative ion exchanger. Further, a carbon dioxide supply device (4) is installed in the middle of the pipe (3) branched from the water outlet of the subsystem to the substrate processing apparatus (1). The hydrogen peroxide removal device (2) has an aspect in which a platinum group metal catalyst is filled. With such a configuration, the concentration of hydrogen peroxide dissolved in the liquid is suppressed to 2 μg / L or less based on ultrapure water that has passed through the ultraviolet oxidation apparatus, and the specific resistance is 0 by adding carbon dioxide. A carbonated water adjusted to a range of 0.03 to 5.0 MΩ · cm is produced, and the substrate in which at least copper or a copper compound is installed in the substrate processing apparatus 1 is cleaned using the carbonated water. |
| priorityDate | 2013-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 71.