| abstract |
A barrier layer formed by vapor deposition of an inorganic compound on at least one surface of the substrate, and a barrier layer formed by vapor deposition of at least the inorganic compound on the substrate; A barrier layer formed by applying a solution containing a polysilazane compound, formed on the same side surface as the formed film, and applying a solution containing the polysilazane compound. The formed barrier layer contains at least one element selected from the group consisting of elements of Group 2, Group 13, and Group 14 of the long-period periodic table (excluding silicon and carbon). The provision of a gas barrier film having excellent gas barrier performance and excellent storage stability in a high-temperature and high-humidity environment, particularly excellent adhesion and folding resistance. |