http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014119301-A1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
filingDate | 2014-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2017-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2014119301-A1 |
titleOfInvention | Surface selective polishing composition |
abstract | The present invention provides a polishing composition that exhibits a high polishing rate ratio of a silicon nitride (SiN) surface to a silicon oxide surface and / or a SiN surface to a polycrystalline silicon (polysilicon) surface. In some embodiments, the polishing composition of the present invention comprises colloidal silica and one or more water soluble polymers and has a pH of 6 or less. Colloidal silica contains one or more organic acids bonded to its surface, and the water-soluble polymer is a polyoxyalkylene hydrocarbyl ether whose hydrocarbyl group has 12 or more carbon atoms. |
priorityDate | 2013-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 77.