http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014103875-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-29 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80 |
| filingDate | 2013-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2014103875-A1 |
| titleOfInvention | Phase shift mask and manufacturing method thereof |
| abstract | In the method of manufacturing the phase shift mask, the surface and the light shielding layer (13) exposed at the pattern opening are covered, and the etching stopper layer (12) and the phase shift layer (11) exposed at the pattern opening are covered in the light shielding region. Instead, the method includes a step of forming a second mask (RP2) having a predetermined opening pattern so as to be covered in the phase shift region. |
| priorityDate | 2012-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.