| abstract |
Provided is a passivation film that simultaneously achieves electrical insulation, heat resistance, solvent resistance, and dry etch back characteristics. The following formula (i): (In the formula, T 0 represents a sulfonyl group, a fluoroalkylene group, a cyclic alkylene group, an arylene group having a substituent, or a combination of an arylene group which may have a substituent and a fluoroalkylene group or a cyclic alkylene group. )) At least one group having the structure of formula (2-A), formula (2-B), or both at the terminal, side chain, or main chain of the polymer. A composition for forming a passivation film comprising a polymer having the same. The polymer has the following formula (1): The unit structure can be included. [Selection figure] None |