http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013108716-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-38 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B33-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-58 |
| filingDate | 2013-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2013108716-A1 |
| titleOfInvention | Negative photosensitive resin composition |
| abstract | Negative photosensitive resin composition that can be thickened, has no tack before exposure, can be patterned with high resolution by alkali development, and the resulting coating film has high transparency and small shrinkage after post-baking To provide things. [Solution] Negative photosensitive resin composition containing the following (A) component, (B) component, and (C) solvent. (A) Component: a copolymer obtained by copolymerizing at least (i) N-alkoxymethyl (meth) acrylamide and (ii) a monomer mixture containing an alkali-soluble monomer. (B) component: a photoacid generator, (C) Solvent. [Selection figure] None |
| priorityDate | 2012-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 305.