http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013088928-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1608 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-267 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26 |
| filingDate | 2012-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2013088928-A1 |
| titleOfInvention | Cleaning agent and method for manufacturing silicon carbide single crystal substrate |
| abstract | The present invention provides a cleaning agent for effectively cleaning a manganese component remaining on and adhering to the surface of a silicon carbide single crystal substrate after polishing with a polishing compound containing a manganese compound by a safe and simple method. . The present invention relates to a cleaning agent for cleaning a silicon carbide single crystal substrate polished with an abrasive containing a manganese compound, the detergent containing at least one of ascorbic acid and erythorbic acid, and having a pH of 6 or less. About. |
| priorityDate | 2011-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 51.