http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013073505-A1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 |
filingDate | 2012-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2015-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2013073505-A1 |
titleOfInvention | Self-assembling composition for pattern formation and pattern forming method |
abstract | The present invention is a self-assembling composition for pattern formation containing [A] a polymer having a group (α) containing a hetero atom at at least one end of a main chain, and [B] polysiloxane. The hetero atom is preferably at least one selected from the group consisting of an oxygen atom, a nitrogen atom, a sulfur atom, a phosphorus atom, a tin atom and a silicon atom. The group (α) is preferably represented by the following formula (1). [A] The polymer is preferably a styrene polymer. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110024081-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110024081-B |
priorityDate | 2011-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 415.