| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1868
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-102 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-00 |
| filingDate |
2012-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2014-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-WO2012144292-A1 |
| titleOfInvention |
Silica-based film forming composition for inkjet, method for forming silica-based film, semiconductor device, and solar cell system |
| abstract |
The present invention contains a silicon compound, a solvent, and a surface conditioner. The solvent is γ-butyrolactone, a second solvent having a boiling point of 80 to 100 ° C., and a third solvent having a boiling point of 180 to 230 ° C. In the inkjet, the mass ratio of the γ-butyrolactone to the total mass of the solvent is 0.2 or more, and the mass ratio of the second solvent to the total mass of the solvent is 0.2 to 0.5 The present invention relates to a silica-based film forming composition. |
| priorityDate |
2011-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |