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filingDate 2012-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2014-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2012133704-A1
titleOfInvention Gas barrier laminated film and method for producing the same
abstract A gas barrier laminated film formed by forming a plurality of inorganic thin film layers on at least one surface of a base film, wherein the inorganic thin film layer has a first layer to an nth layer (n is 1). A gas barrier laminate film in which an n + 1th layer formed in contact therewith is formed by a counter target sputtering method, and a base film A method for producing a gas barrier laminated film in which one or more inorganic thin film layers are formed on at least one surface, wherein the first to nth layers on the base film side in the inorganic thin film layer are formed by non-plasma film formation. This is a method for producing a gas barrier laminated film in which an n + 1th layer in contact therewith is formed by an opposed target sputtering method, and a substrate film for forming an inorganic thin film layer is formed. , In particular, damage to the resin film is small, the deposition highly dense inorganic thin layer, high gas barrier properties, provides an excellent gas barrier laminate film and a manufacturing method thereof productivity.
priorityDate 2011-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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