| abstract |
PROBLEM TO BE SOLVED: To provide a resist underlayer film forming composition for lithography for forming a resist underlayer film that can be used as a hard mask. The silane includes a hydrolyzable organosilane, a hydrolyzate thereof, or a hydrolysis condensate thereof, and the silane is represented by the following formula (1): [Chemical 1] [Wherein R 3 represents formula (2), formula (3), or formula (4): [Chemical 2] (Wherein, at least one of R 4 , R 5 , and R 6 is bonded to the Si atom directly or via a linking group), and R 1 Is an organic group having an alkyl group, aryl group, aralkyl group, halogenated alkyl group, halogenated aryl group, halogenated aralkyl group, alkenyl group, or epoxy group, acryloyl group, methacryloyl group, mercapto group, amino group, or cyano group Represents a group or a combination thereof. R 2 represents an alkoxy group, an acyloxy group, or a halogen atom. ] The resist underlayer film forming composition for lithography containing the hydrolyzable organosilane represented by these. [Selection figure] None |