http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2012090777-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-16 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-166 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-042 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50 |
| filingDate | 2011-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2012090777-A1 |
| titleOfInvention | Vapor deposition method, vapor deposition film, and organic electroluminescence display device manufacturing method |
| abstract | The vapor deposition method of the present invention includes a preparation step of preparing a mask unit in which the relative positions of the shadow mask (81) and the vapor deposition source (85) are fixed, and at least of the mask unit and the deposition target substrate (200). The second shutter (so as to shield the vapor deposition flow flowing to the vapor deposition unnecessary region (210) and the vapor deposition process in which one side is relatively moved and vapor deposition flow emitted from the vapor deposition source (85) is vapor deposited in the vapor deposition region (210). 111) is provided. |
| priorityDate | 2010-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 70.