abstract |
A photoresist (13) is formed on the surface of the substrate (3) where the deposited film is formed, and an opening is formed in the sealing region where the sealing resin (11) including the display region (R1) is formed in a frame shape. After that, a light emitting layer (8R, 8G, 8B) having a stripe pattern is formed, and then the photoresist (13) is removed with a stripping solution, and the light emitting layer patterned with high definition ( 8R · 8G · 8B). |