http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2012073938-A1

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4966
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34
filingDate 2011-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2014-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2012073938-A1
titleOfInvention Semiconductor device manufacturing method, substrate processing method, and substrate processing apparatus
abstract A step of accommodating the substrate in the processing chamber, and a step of supplying a source gas containing a metal element, a nitrogen-containing gas, and a hydrogen-containing gas into the processing chamber to form a metal nitride film on the substrate. In the step of forming a film, the source gas and the nitrogen-containing gas are intermittently supplied into the processing chamber, the source gas and the nitrogen-containing gas are intermittently supplied alternately into the processing chamber, or the nitrogen containing into the processing chamber is contained. The source gas is intermittently supplied into the processing chamber while the gas supply is continued, and the hydrogen-containing gas is supplied into the processing chamber at least during the supply period of the nitrogen-containing gas into the processing chamber.
priorityDate 2010-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003077864-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06314660-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006024668-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004296490-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6098404
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451375938
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578677
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546203
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520718
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415207654
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID90570
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6101811
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82218
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419593302
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID139613
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448617527
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID160806
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6101810
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24394
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449460707
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520474
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579030
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID431650296
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61497
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6431882
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419549759
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6432707
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415776239
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24817
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578621
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415788843
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID37715
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449483415
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419516414
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID50911921
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID222
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID94359
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID58943003
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453343233
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3035372
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451241001
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID83301
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451675535
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526467
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID522684
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID407174045
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410444226
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID154084666
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5391
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID431909531
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID140348028
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82895
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523855
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123185
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579069

Total number of triples: 76.