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filingDate 2011-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2013-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2012018043-A1
titleOfInvention Resin mold for nanoimprint
abstract A resin mold for nanoimprinting having a resin layer having fine irregularities formed on the surface, the resin layer comprising 1 to 49 parts by weight of a silicone macromonomer and / or a fluorine macromonomer, and 99 to 51 parts by weight Part of the (meth) acrylic monomer, styrene monomer, epoxy monomer, olefin monomer, and at least one polymerizable monomer selected from the group consisting of polycarbonate resin-forming monomers, the silicone The molecular weight of the macromonomer and / or the fluorine-based macromonomer is in the range of 600 to 10,000, and the macromonomer has a reactive group copolymerizable with the polymerizable monomer at the end of the molecule, and the reactive group is Silico which constitutes the macromonomer when copolymerized with the polymerizable group Wherein the emission system unit or fluorine-based unit forms a side chain on stem polymer formed from the polymerizable monomer and macromonomer.
priorityDate 2010-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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