| abstract |
An object of the present invention is to provide a compound having high solubility in a safe solvent, high sensitivity, and good resist pattern shape, a radiation-sensitive composition containing the compound, and a resist pattern forming method using the composition. . Means for solving a compound (B) obtained by reacting a polyphenol-based cyclic compound (A) with a compound (C) having a specific structure, a radiation-sensitive composition containing the compound, and a resist pattern forming method using the composition And |