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filingDate 2010-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2013-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2011052657-A1
titleOfInvention Precursor composition of porous film and method for forming porous film
abstract The precursor composition of the porous film is destroyed at a temperature higher than the temperature at which the first alkoxysilane compound, the second alkoxysilane compound, and the first alkoxysilane compound and the second alkoxysilane compound are copolymerized. And a nonionic surfactant micelle. Of these, the first alkoxysilane compound is tetraalkoxysilane, monoalkyltrialkoxysilane, dialkyldialkoxysilane, tetraalkoxysilane polymer, monoalkyltrialkoxysilane polymer, and dialkyldialkoxysilane polymer. The second alkoxysilane compound is at least one selected from the group consisting of trialkoxyphenylsilanes.
priorityDate 2009-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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