http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2011018928-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2010-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2011018928-A1 |
| titleOfInvention | Resist underlayer film forming composition containing polymer-type photoacid generator and method for forming resist pattern using the same |
| abstract | A resist underlayer film forming composition containing a polymer-type photoacid generator and a resist pattern forming method using the same. A resist underlayer film forming composition comprising a polymer having a structural unit represented by the following formula (A-1) or a structural unit represented by the following formula (A-2). [Chemical 1] {In Formula (A-1) and Formula (A-2), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 represent an organic group. } [Selection figure] None |
| priorityDate | 2009-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 123.