http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2011016323-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2010-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2011016323-A1 |
| titleOfInvention | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method using the same |
| abstract | The chemical mechanical polishing aqueous dispersion according to the present invention is a chemical mechanical polishing aqueous dispersion containing silica particles (A) and a compound (B) having two or more carboxyl groups, wherein the chemical In the particle size distribution obtained by measuring the mechanical polishing aqueous dispersion by the dynamic light scattering method, the particle diameter (Db) showing the highest detection frequency (Fb) of the silica particles (A) is 35 nm <Db ≦ 90 nm. The ratio (Fa / Fb) between the detection frequency (Fa) and the detection frequency (Fb) when the particle diameter (Da) is in the range of 90 nm <Da ≦ 100 nm is 0.5 or less. To do. |
| priorityDate | 2009-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 87.