http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2010122985-A1

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
filingDate 2010-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2012-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2010122985-A1
titleOfInvention Polishing liquid for semiconductor substrate and method for polishing semiconductor substrate
abstract The present invention contains abrasive particles, 1,2,4-triazole, and a basic compound, the basic compound is a nitrogen-containing basic compound or an inorganic basic compound, and the content of the basic compound is The present invention relates to a polishing liquid for a semiconductor substrate which is 0.1% by mass or more and has a pH of 9 or more and 12 or less.
priorityDate 2009-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10129990
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9257
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21989496
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID439239
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID420754769
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14923
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559464
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453327643
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419519962
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14797
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449456859
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449266279
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14798
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8112
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID15826429
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID406908050
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID15913
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453615033
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID60966
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID67516
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7847
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419517616
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411738766
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410697574
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454334062
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID409060395
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450414884
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14098
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526595
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23670858
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541

Total number of triples: 51.