abstract |
The present invention provides a transfer material suitable for a nanoimprint method having high dry etching resistance to argon gas, high dry etching rate selectivity with argon gas and oxygen gas, and capable of forming a fine pattern used for a resist or the like. An object of the present invention is to provide a curable composition. The present invention relates to a transfer material comprising an aminotriazine compound, a compound having a hydroxyl group and a (meth) acryloyl group in the molecule, and a (meth) acrylate compound having a triazine skeleton obtained by reacting an aldehyde. It is a curable composition. |