http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2010021359-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-143 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-093 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2009-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2010021359-A1 |
| titleOfInvention | Resist sensitivity improvement method |
| abstract | [PROBLEMS] To improve resist sensitivity when a pattern is formed on a resist made of hydrosilsesquioxane by irradiation with a charged particle beam. [Solution] The resist sensitivity improving method of the present invention is a resist for improving the sensitivity of a resist to a charged particle beam when a pattern is formed on the resist formed from hydrosilsesquioxane by irradiation of the charged particle beam. A method for improving sensitivity, wherein a resist formed from hydrosilsesquioxane applied on a substrate is pre-baked at t ° C. (20 ≦ t ≦ 300), and a water-soluble conductive polymer compound is obtained. The composition containing the composition is applied to the charged particle beam irradiated surface of the pre-baked resist, and the applied composition is baked at T ° C. (where 0 ≦ T <t + 40), and then the resist It is characterized by irradiating with a charged particle beam. |
| priorityDate | 2008-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 89.