http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2010001780-A1

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filingDate 2009-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2011-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2010001780-A1
titleOfInvention Heat resistant resin precursor and photosensitive resin composition using the same
abstract According to the present invention, a photosensitive resin composition is highly sensitive, and a pattern can be formed by a developer (2.38 wt% tetramethylammonium hydroxide aqueous solution) that is usually used in the manufacturing process of a semiconductor device. There is provided a novel alkali-soluble resin which is excellent in the mechanical strength of the heat-resistant film after curing, that is, has a high glass transition temperature and is excellent in the solubility of the relief pattern after development in propylene glycol monomethyl ether. The alkali-soluble resin according to the present invention has the following general formula (1): {Wherein X 1 represents a tetravalent organic group containing a halogen atom, and Z 1 represents the following general formula (2): (Wherein, L 1 and L 2 each independently represent a methyl group or a hydroxyl group, and n 1 and n 2 each represent an integer of 0 to 3 when a plurality of L 1 and L 2 are present.) Represents an organic group having a valence, and m 1 represents an integer of 1 to 200. } In the molecule.
priorityDate 2008-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 604.