http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2009119485-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2009-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2009119485-A1 |
| titleOfInvention | Polishing liquid for metal and polishing method using this polishing liquid |
| abstract | The metal polishing liquid of the present invention is a polishing liquid containing water, an oxidizing agent, a metal oxide dissolving agent, an anticorrosive, and a metal oxide dissolution adjusting agent, and the pH of the polishing solution is in the range of 1 to 5. The anticorrosive contains at least one of tolyltriazole and diphenylguanidine. The polishing method of the present invention is a method for polishing a substrate, and the metal polishing liquid is supplied between the surface and the polishing cloth in a state where the surface to be polished of the substrate is pressed against the polishing cloth of the polishing platen. Meanwhile, the substrate is polished by relatively moving the polishing cloth and the substrate. |
| priorityDate | 2008-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 110.