http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2009072496-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-68 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-675 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C43-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C59-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C31-133 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-15 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C67-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-367 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-736 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C43-21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C43-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C41-30 |
| filingDate | 2008-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2009072496-A1 |
| titleOfInvention | Novel tricyclodecane derivative and process for producing the same |
| abstract | The present invention (1) A novel tricyclodecane derivative compound useful as a modifier for a photoresist resin, a dry etching resistance improver, an agricultural pharmaceutical intermediate, and other various industrial products in the field of photolithography, and a production method thereof, (2) Tricyclodecane derivative compounds useful as cross-linkable resins, optical materials such as optical fibers and optical waveguides, optical disk substrates, photoresists and the like, raw materials thereof, pharmaceutical and agrochemical intermediates, and other various industrial products, and (3) As a chemically amplified resist sensitive to far-ultraviolet rays typified by KrF excimer laser, ArF excimer laser, F2 excimer laser or EUV, the resolution is maintained without losing the basic physical properties as resists such as pattern shape, dry etching resistance and heat resistance. Functional resin, functional resin composition excellent in alkali developability and substrate adhesion capable of achieving improved line edge roughness, and raw material compounds thereof, Can be provided. |
| priorityDate | 2007-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 255.