http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2009072438-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02363 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0236 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 2008-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2009072438-A1 |
| titleOfInvention | Polycrystalline silicon substrate manufacturing method and polycrystalline silicon substrate |
| abstract | A safe and low-cost method for manufacturing a polycrystalline silicon substrate that can easily form a uniform and fine concavo-convex structure suitable for a solar cell on the surface of a polycrystalline silicon substrate, and excellent in photoelectric conversion efficiency, and uniform and fine A polycrystalline silicon substrate having a pyramidal concavo-convex structure and capable of remarkably reducing reflectance is provided. The polycrystalline silicon substrate is etched using an alkaline etching solution containing at least one selected from the group consisting of a carboxylic acid having 1 to 12 carbon atoms and a salt thereof having at least one carboxyl group in one molecule. An uneven structure is formed on the surface of the polycrystalline silicon substrate. |
| priorityDate | 2007-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 145.