| abstract |
The object of the present invention is that the pattern shape obtained is good, the amount of the eluate in the immersion exposure liquid contacted during immersion exposure is small, and the receding contact angle between the resist film and the immersion exposure liquid is large. And providing a radiation-sensitive resin composition with few development defects and a polymer used therefor. This composition contains a polymer, a resin containing an acid labile group, an acid generator and a solvent, and the polymer is a repeating unit represented by the following formulas (1) and (2). Containing. [R 1 and R 2 each represent a hydrogen atom, a methyl group or a trifluoromethyl group, and R 3 represents an alkyl group having 1 to 6 carbon atoms, wherein at least one hydrogen atom is substituted with a fluorine atom, or C4-20 alicyclic hydrocarbon group or its derivative is shown, Z shows group containing the group which generate | occur | produces an acid by light irradiation. ] |