http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2009044667-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 |
| filingDate | 2008-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2009044667-A1 |
| titleOfInvention | Radiation sensitive composition |
| abstract | The radiation-sensitive composition of the present invention includes a repeating unit (a-1) represented by the following general formula (a-1), a repeating unit (a-2) represented by the following general formula (a-2), And a polymer (A) containing a repeating unit (a-3) having an acid dissociable group, and a radiation-sensitive acid generator (B), which not only have excellent resolution performance but also LWR. Is a radiation-sensitive composition capable of forming a resist film that is small in size, excellent in pattern collapse resistance, and excellent in defectivity. (In general formulas (a-1) and (a-2), R 1 represents a methyl group, R 2 represents a linear or branched alkyl group having 1 to 12 carbon atoms, and R 3 represents Represents a hydroxyl group, etc.) |
| priorityDate | 2007-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 556.