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filingDate 2008-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2010-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-WO2009011407-A1
titleOfInvention Method for producing group III nitride single crystal
abstract A base film 2 made of group III nitride is formed on the substrate 1 by vapor phase growth. By subjecting the substrate 1 and the base film 2 to heat treatment in the presence of hydrogen, the base film 2 is removed and the surface of the substrate 1 is roughened. A seed crystal film 4 made of a group III nitride single crystal is formed on the surface of the substrate 1A by a vapor phase growth method. Group III nitride single crystal 5 is grown on seed crystal film 4 by a flux method.
priorityDate 2007-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 33.