http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2008111251-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2007-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2008111251-A1 |
| titleOfInvention | Resist composition, resist pattern forming method, and electronic device manufacturing method |
| abstract | In immersion exposure technology, a resist composition capable of suppressing elution into the immersion medium and forming a fine resist pattern without degradation in performance, a method for forming a resist pattern using the resist composition, and a method for manufacturing an electronic device The purpose is to provide. The resist composition of the present invention is for immersion exposure and comprises a silicon compound having at least an alkali-soluble group which may be substituted with a substituent, and an alkali-soluble group which may be substituted with an acid leaving group. A resin having at least. |
| priorityDate | 2007-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.