| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1008 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2010-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-WO2008066019-A1 |
| titleOfInvention |
Planographic printing plate material |
| abstract |
The present invention relates to a lithographic printing plate material comprising a resin having a residue of a cyclic ureido compound derived from at least one cyclic ureido compound selected from a specific cyclic ureido compound on a support. A lithographic printing plate material having scratch resistance corresponding to high productivity in large plates, sensitivity to a low activity developer with low pH or fatigue, and excellent development latitude. Can be provided. |
| priorityDate |
2006-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |