http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2008010521-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-687 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-182 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2007-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-WO2008010521-A1 |
| titleOfInvention | Photosensitive resin composition |
| abstract | The present invention relates to a photocationic polymerization initiator (A) which is sulfonium tris (pentafluoroethyl) trifluorophosphate, an epoxy compound (a) having two or more epoxy groups in one molecule, and one in one molecule. It comprises an alkali-soluble epoxy compound (B) obtained by reacting a polybasic acid anhydride (c) with a reaction product (I) of a compound (b) having the above carboxyl group and one or more hydroxyl groups. The present invention relates to a photosensitive resin composition. |
| priorityDate | 2006-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 260.