http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2007145249-A1
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2007-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2009-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-WO2007145249-A1 |
titleOfInvention | Positive photosensitive resin composition containing a polymer compound having a ring structure |
abstract | Positive photosensitivity with high sensitivity and little film loss in unexposed areas, high transmittance and film thickness are maintained even after high-temperature baking or resist stripping treatment after film formation, and cracks do not occur during ITO sputtering To provide a cured film suitable for a resin composition and various display film materials. The component (A) has at least one of a carboxyl group and a phenolic hydroxy group and at least one of a hydroxy group other than the phenolic hydroxy group and an amino group having an active hydrogen, and has a number average molecular weight. An alkali-soluble acrylic polymer (B) having a cyclic structure of 2,000 to 30,000: an alkali-soluble resin having a ring structure in the main chain (C) component: a compound having a vinyl ether group (D) component: a blocked isocyanate group Compound (E) component: a positive photosensitive resin composition containing a photoacid generator (F) solvent and a cured film obtained using the composition. [Selection figure] None |
priorityDate | 2006-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 471.